... electron beam processing 电子束加工 electron beam projection 电子束投影 electron beam projector 电子枪 ...
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reducing electron beam projection system 缩小式电子束投影系统
Electron Beam Projection Lithography 投射式电子束微影术 ; 电子束微影技术
The projection electron beam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.
具有角度限制的电子束投影曝光技术有可能成为21世纪最有潜力的纳米光刻技术之一。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
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